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題目作者分類號關鍵字作者單位刊名語言出版時間
Korean Leader Won Over By Dragon TQ175.7The Refractories Engineer英文2010-01-05
PRESIDENT'S COLUMN Peter Rooney;TQ175.7The Refractories Engineer英文2010-01-05
Pyrotek product solutions and local support assist Portland smelter TQ175.7The Refractories Engineer英文2010-01-05
Resin Free Tundish Dry Mix at SSAB Lulea Steinar Slagnes;Hakan Wahlberg;Odd Westeras;TQ175.7The Refractories Engineer英文2010-01-05
a-SiOx Coatings Grown on Dental Materials by PECVD: Compositional Analysis and Preliminary Investigation of Biocompatibility Improvements Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;TQ175biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio MaterialiChemical vapor deposition英文2010-01-05
Glass furnace refractory supply and developments - 'Interesting times' Geoff Evans;TQ175.7The Refractories Engineer英文2010-01-05
The Synthesis of Highly Loaded Cu/Al2O3 and Cu/ZnO/Al2O3 Catalysts by the Two-Step CVD of CuIIdiethylamino-2-propoxide in a Fluidized-Bed Reactor Michael Becker;Raoul Naumann d‘Alnoncourt;Kevin Kahler;Jelena Sekulic;Roland A. Fischer;Martin Muhler;TQ175copper;fluidized-bed reactor;methanol synthesis;nanocomposites;two-step deposition;zinc oxide;Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Chemical vapor deposition英文2010-01-05
Synthesis of gallium nitride nanoparticles by microwave plasma-enhanced CVD Shimada, M.;Wang, W.-N.;Okuyama, K.;TQ175Gas-phase synthesis;III-V materials;Light-emitting diode;Monodispersed particles;Semiconductor;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8527, Japan;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, KagamChemical vapor deposition英文2010-01-05
Growth and characterization of ti-ta-o thin films on si substrates by liquid injection MOCVD for high-k applications from modified titanium and tantalum precursors Devi, A.;Hellwig, M.;Barreca, D.;Parala, H.;Thomas, R.;Becker, H.-W.;Katiyar, R.S.;Fischer, R.A.;Tondello, E.;TQ175High-k oxides;LI-MOCVD;Precursor chemistry;Thin films;Ti-Ta-O;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-44780, Bochum, Germany;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-Chemical vapor deposition英文2010-01-05
Almatis Group Receives Authority to Enter Into Plan Support Agreement and Execute Related Commtment Letters TQ175.7 The Refractories Engineer英文2010-01-05
ELECTRIC STEEL MAKERS GUILD Miles Berry;TQ175.7The Refractories Engineer英文2010-01-05
THE EDITOR SPEAKS OUT John May;TQ175.7The Refractories Engineer英文2010-01-05
Synthesis of wo_3 nanogranular thin films by hot-wire CVD Houweling, Z.S.;Geus, J.W.;Schropp, R.E.I.;TQ175Amorphous;Crystalline;Rutherford backscattering spectrometry;Thin films;Tungsten oxide;Nanophotonics - Physics of Devices, Debye Institute of Nanomaterials Science, Utrecht University Princetonlaan 4, 3584 CB Utrecht, Netherlands;Electron Microscopy Utrecht, Utrecht University Padualaan 8, 3584 CH Utrecht, Netherlands;Nanophotonics - PhysicChemical vapor deposition英文2010-01-05
Raman studies of nano-and ultra-nanocrystalline diamond films grown by hot-filament CVD Klauser, F.;Steinmüller-Nethl, D.;Kaindl, R.;Bertel, E.;Memmel, N.;TQ175AFM;HFCVD;NCD;Raman;UNCD;XRD;Institute of Physical Chemistry, University of Innsbruck Innrain 52a, 6020, Innsbruck, Australia;R-BeSt coating GmbH Exlgasse 20a, 6020, Innsbruck, Australia;Institute of Mineralogy Petrography, University of Innsbruck Innrain 52, 6020, Innsbruck, AustralChemical vapor deposition英文2010-01-05
Chrome-Free Alumina Porous Refractory (Part II) SEIICHIRO KONO;AKIHIRO TSUCHINARI;TQ175Journal of the Technical Association of Refractories英文2010-01-05
Small Pipe Refractory-Lined Repair System KEISUKE GOZU;TQ175Journal of the Technical Association of Refractories英文2010-01-05
REACH and Minelco Ltd TQ175.7The Refractories Engineer英文2010-01-05
Preferential orientation in hematite films for solar hydrogen production via water splitting Cornuz, M.;Gr?tzel, M.;Sivula, K.;TQ175Institut des Sciences et Ingénierie Chimiques, ?cole Polytechnique Fédérale, Lausanne CH-1015 Lausanne, Switzerland;Institut des Sciences et Ingénierie Chimiques, ?cole Polytechnique Fédérale, Lausanne CH-1015 Lausanne, Switzerland;Institut des Sciences eChemical vapor deposition英文2010-01-05
CVD Co_3O_4 nanopyramids: A nano-platform for photo-assisted H_2 production Barreca, D.;Fornasiero, P.;Gasparotto, A.;Gombac, V.;MacCato, C.;Pozza, A.;Tondello, E.;TQ175CNR-ISTM and INSTM Department of Chemistry, Padova University, via F. Marzolo, 1, 35131 Padova, Italy;Department of Chemistry, ICCOM-CNR Trieste Research Unit, Trieste University, via L. Giorgieri, 1, 34127 Trieste, Italy;Department of Chemistry, Padova UChemical vapor deposition英文2010-01-05
Substrate-dependant ability of titanium(IV) oxide photocatalytic thin films prepared by thermal CVD to generate hydrogen gas from a sacrificial reaction Hyett, G.;Darr, J.A.;Mills, A.;Parkin, I.P.;TQ175Christopher Ingold Laboratory, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Christopher Ingold Laboratory, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Department of Pure and Applied ChemistrChemical vapor deposition英文2010-01-05
Hydrogen production by glycerol steam reforming with ru-based catalysts: A study on sn doping Gallo, A.;Pirovano, C.;Marelli, M.;Psaro, R.;Dal Santo, V.;TQ175Glycerol;Hydrogen;Ruthenium;Steam reforming;Tin;CNR, Istituto di Scienze Tecnologie Molecolari, Via G. Fantoli 16/15, Milano, 20138, Italy;CNR, Istituto di Scienze Tecnologie Molecolari, Via G. Fantoli 16/15, Milano, 20138, Italy;CNR, Istituto di Scienze Tecnologie Molecolari, Via G. Fantoli 16/15, MilChemical vapor deposition英文2010-01-05
Fabrication of La_(0.8)Sr_(0.2(CrO_3-based perovskite film via flame-assisted vapor fdeposition for H_2 production by reforming Assabumrungrat, S.;Charojrochkul, S.;Sansernnivet, M.;Laosiripojana, N.;TQ175FAVD;Lanthanum chromite (La_(0.8)Sr_(0.2)CrO_3);Methane steam reforming;Perovskite;Solid oxide fuel cells;Department of Chemical Engineering, Chulalongkorn University, Bangkok, Thailand;National Metal and Materials Technology Center, Pathumthani, Thailand;Joint Graduate School of Energy and Environment, KMUTT, Bangkok, Thailand;Joint Graduate School of EnergyChemical vapor deposition英文2010-01-05
CVD nanocasting routes to zeolite-templated carbons for hydrogen storage Xia, Y.;Yang, Z.;Mokaya, R.;TQ175Hydrogen storage;Microporosity;Porous carbon;Template;Zeolite;College of Engineering, Mathematics and Physical Sciences, University of Exeter, Exeter EX4 4QF, United Kingdom;School of Chemistry, University of Nottingham, University Park, Nottingham NG7 2RD, United Kingdom;School of Chemistry, University of NottinghaChemical vapor deposition英文2010-01-05
Reactivity of silicon surfaces in the presence of adsorbed hydrogen and chlorine Cavallotti, C.;TQ175Coupled cluster;Hydrogen;Hydrogen chloride;Silicon;Surface reactions;Department di Chimica Materiali e Ingegneria Chimica G. Natta, Politecnico di Milano, Via Mancinelli 7, 20131 Milano, ItalyChemical vapor deposition英文2010-01-05
Modeling the transport and reaction mechanisms of copper oxide CVD Arana-Chavez, D.;Toumayan, E.;Lora, F.;McCaslin, C.;Adomaitis, R.A.;TQ175Copper oxide;Mathematical modeling;PEC hydrogen production;Reaction equilibrium;Response;Surface models;Department of Chemical and Biomolecular Engineering, Institute for Systems Research, University of Maryland, College Park, MD 20742, United States;Department of Chemical and Biomolecular Engineering, Institute for Systems Research, University of Maryland,Chemical vapor deposition英文2010-01-05
Special issue on 'CVD and hydrogen' Barreca, D.;Gasparotto, A.;TQ175CNR-ISTM Department of Chemistry, INSTM Department of Chemistry, Padova University, via F. Marzolo 1, 35131 Padova, Italy;Department of Chemistry, Padova University, INSTM, via F. Marzolo 1, 35131 Padova, ItalyChemical vapor deposition英文2010-01-05
Role of hydrogen in the CVD of wide bandgap nitride semiconductors Pearton, S.J.;Polyakov, A.Y.;TQ175Aluminum gallium nitride;Gallium nitride;Hydrogen;Department of Materials Science and Engineering, University of Florida, Gainesville FL 32611, United States;Institute of Rare Metals, B. Tolmachevsky, 5, 119017, Moscow, Russian FederationChemical vapor deposition英文2010-01-05
Production and detection of H atoms and vibrationally excited H_2 molecules in CVD processes Umemoto, H.;TQ175H atoms;H_2 molecules;Laser spectroscopy;Mass spectrometry;Faculty of Engineering, Shizuoka University, Johoku, Naka, Hamamatsu, Shizuoka 432-8561, JapanChemical vapor deposition英文2010-01-05
lastcrete Equipment Company Offers Efficient, Economical MX-10 Mixer/Pump TQ175.7The Refractories Engineer英文2010-01-05
Processing and Properties of Some Clay Bonded Silicon Carbide Refractories S.B. Hanna;I.A.Nasr;W.K. Naguib;TQ175.7Refractories, Ceramics and Building materials Dept. National Research Center, Doki, Cairo, Egypt;Refractories, Ceramics and Building materials Dept. National Research Center, Doki, Cairo, Egypt;Refractories, Ceramics and Building materials Dept. National The Refractories Engineer英文2010-01-05

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