作者：Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;
作者單位：Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2010-01-05
卷：16
期：40911
起頁：29
止頁：34
分類號：TQ175
語種：英文
關鍵詞：biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;
內容簡介Silicon-oxygen amorphous thin film alloys (a-SiOx) are grown at room temperature by plasma-enhanced (PE)CVD on two dental materials; a ceramic and a microcomposite resin.Acompositional analysis of substrates and films is performed by energy dispersive X-ray spectroscopy (EDX), while the sample morphologies are investigated by optical microscopy. Some preliminary investigations on the interaction of substrates and coatings with cells give indications in favor of a-SiOx biocompatibility, and show that the application of coatings based on this material may have a good potential for the reduction of cytotoxicity in dental materials.
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