作者：Umemoto, H.;
作者單位：Faculty of Engineering, Shizuoka University, Johoku, Naka, Hamamatsu, Shizuoka 432-8561, Japan
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2010-01-05
卷：16
期：41194
起頁：275
止頁：290
分類號：TQ175
語種：英文
關鍵詞：H atoms;H_2 molecules;Laser spectroscopy;Mass spectrometry;
內(nèi)容簡介Radical species, including atomic hydrogen, play an important role in the CVD process to prepare high-quality thin solid films. Detailed information on the absolute densities of these radicals under various conditions is needed in order to understand the chemical kinetics involved and to control the deposition processes. This article reviews the production mechanisms and the gas-phase diagnostic techniques for H atoms in catalytic CVD (also called hot-wire CVD) and plasma-enhanced (PE)CVD processes. Experimentally determined absolute H-atom densities in typical CVD processes are compiled in a table. Under suitable conditions, the steady-state H-atom density can be increased up to 10 ~(17) cm~(-3). Procedures for producing and detecting vibrationally excited H_2 molecules, which can be another active species in CVD processes, are also discussed. The production mechanisms and the gas-phase diagnostic techniques for H atoms, which play important roles in catalytic CVD (also called hot-wire CVD) and plasma-enhanced CVD processes, were reviewed. Experimentally determined absolute H-atom densities in typical CVD processes are compiled in a table. Procedures for producing and detecting vibrationally excited H2 molecules, which can be another active species in CVD processes, are also discussed.
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