Reaction Mechanism of Aluminum Metal in Castables YASUHIRO OHBA;TAKASHI MATSUE;MITSUTO MURAOKA;TQ175Taiko Refractories Co., Ltd.;Taiko Refractories Co., Ltd.;Taiko Refractories Co., Ltd.Journal of the Technical Association of Refractories英文2010-01-05
Influence of Al_2O_3 on Precipitation of Cr~(6+) Compound in Ca-Cr-O System YASUHIRO HOSHIYAMA;TOMOYUKI MAEDA;AKIRA YAMAGUCHI;TQ175Okayama Ceramics Research Foundation, Ryukoku University;Okayama Ceramics Research Foundation, Ryukoku University;Okayama Ceramics Research Foundation, Ryukoku UniversityJournal of the Technical Association of Refractories英文2010-01-05
Effect of TiO_2 Addition on Alumina-Magnesia Castables HISAHARU SASAKI;YUMI KIMURA;KIYOYUKI KOMATSUBARA;TQ175Shinagawa Refractories Co., Ltd.;Shinagawa Refractories Co., Ltd.;Shinagawa Refractories Co., Ltd.Journal of the Technical Association of Refractories英文2010-01-05
Multifunctional nanocomposite thin films by aerosol-assisted CVD Warwick, M.E.A.;Dunnill, C.W.;Binions, R.;TQ175AACVD;Nanocomposites;Thin films;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, Chemical vapor deposition英文2010-01-05
Investigation of atmospheric pressure CVD-produced aluminum coatings for the protection of steel from corrosion Gu, S.;Maeng, S.;Suh, Y.;Levy, R.A.;Deavenport, D.L.;Gómez, F.J.;Newberg, S.S.;Brooman, E.W.;Berman, E.S.;Kleek, J.J.;Beatty, J.H.;Schwartz, A.S.;Gaydos, S.P.;TQ175Aluminum;APCVD;Corrosion protection;Step coverage;TIBAL;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 071Chemical vapor deposition英文2010-01-05
Using precursor chemistry to template vanadium oxide for chemical sensing Beardslee, J.A.;Mebust, A.K.;Chaimowitz, A.S.;Davis-Vanatta, C.R.;Moersch, T.L.;Afridi, M.Y.;Taylor, C.J.;Leonard, H.;TQ175Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, PoChemical vapor deposition英文2010-01-05
Growth of [100]-textured gadolinium nitride films by CVD Brewer, J.R.;Gernhart, Z.;Liu, H.-Y.;Cheung, C.L.;TQ175Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0304, United States;School of Science, Buena Vista University, Storm Lake, IA 50588, United States;Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska Chemical vapor deposition英文2010-01-05
Mass analysis of growth of AL _2O _3 thin films from low-temperature atomic layer deposition on woven cotton Hojo, D.;Adschiri, T.;TQ175Aluminum oxide;Atomic layer deposition;Conformal coatings;Cotton;Three-dimensional structures;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, JapanChemical vapor deposition英文2010-01-05
[cis-(1,3-diene) _2W(CO) _2] complexes as MOCVD precursors for the deposition of thin tungsten - Tungsten carbide films Jipa, I.;Heinemann, F.W.;Schneider, A.;Popovska, N.;Siddiqi, M.A.;Siddiqui, R.A.;Atakan, B.;Marbach, H.;Papp, C.;Steinrück, H.-P.;Zenneck, U.;TQ175Diene complexes;MOCVD;Tungsten;Tungsten carbide;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM), Universit?t Erlangen-Nürnberg, Egerlandstrasse 1, D-91058 Erlangen, Germany;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM),Chemical vapor deposition英文2010-01-05
Direct and Protein-Mediated Cell Attachment on Differently Terminated Nanocrystalline Diamond Frederik Klauser;Martin Hermann;Doris Steinmuller-Nethl;Oliver Eiter;Alberto Pasquarelli;Erminald Bertel;Thomas Seppi;Peter Lukas;Thomas Lechleitner;TQ175cell adhesion;FBS;HF-CVD;NCD;protein adsorption;Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of TheraChemical vapor deposition英文2010-01-05
Comparison of Coupling Methods for Linking Between Reactor and Feature Scales Jonathan Jilesen;Fue-Sang Lien;TQ175Biomaterials;Calcium lactate;Hydroxyapatite;PP-MOCVD;Trimethyl phosphate;Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada);Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada)Chemical vapor deposition英文2010-01-05
Sulfur- and Nitrogen-Doped Titania Biomaterials via APCVD Charles W. Dunnill;Zoie A. Aiken,;Jonathan Pratten;Ivan P. Parkin;TQ175antimicrobial materials;doped titanium dioxide;thin films;visible light photocatalysts;biomaterials;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre foChemical vapor deposition英文2010-01-05
Atomic layer deposition of gadolinium aluminate using gd (~iprcp)_3, TMA, and O_3 or H_2O Adelmann, C.;Pierreux, D.;Swerts, J.;Dewulf, D.;Hardy, A.;Tielens, H.;Franquet, A.;Brijs, B.;Moussa, A.;Conard, T.;Van Bael, M.K.;Maes, J.W.;Jurczak, M.;Kittl, J.A..;Van Elshocht, S.;TQ175ALD;Cyclopentadienyl;Gadolinium aluminate;Gadolinium oxide;High-k oxides;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Institute for Materials Research, Inorganic and Physical Chemistry, Hasselt University, B-3590, Diepenbeek, Belgium;Institute for MaterialChemical vapor deposition英文2010-01-05
A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc Kate Black;Paul R. Chalker;Anthony C. Jones;Peter J. King;John L. Roberts;Peter N. Heys;TQ175dimethylzinc adducts;liquid injection MOCVD;ZnO nanowires;Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Chemical vapor deposition英文2010-01-05
Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2 Anthony C. Jones;John Bacsa;Paul R. Chalker;Paul A. Marshall;Hywel O. Davies;Peter N. Heys;Paul O’Brien, Mohammad Afzaal;James Raftery;Gary W. Critchlow;Kate Black;TQ175MOCVD;Titanium 2;5-dimethylpyrrolyl complexes;Titanium dioxide;Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University Chemical vapor deposition英文2010-01-05
Mechanization of Refractory Repair Work with Centrifugal Force Shot Method (Rotary-Shot Method) HIROSHI IMAGAWA;TADASHI IKEMOTO;KOJI KONO;TQ175Department of Inorganic Materials Research & Development, the Environment and Process Technology Center, the Technical Development Bureau, Nippon Steel Corporation;Department of Inorganic Materials Research & Development, the Environment and Process TechnJournal of the Technical Association of Refractories英文2010-01-05