作者：Anthony C. Jones;John Bacsa;Paul R. Chalker;Paul A. Marshall;Hywel O. Davies;Peter N. Heys;Paul O’Brien, Mohammad Afzaal;James Raftery;Gary W. Critchlow;Kate Black;
作者單位：Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2010-01-05
卷：16
期：40911
起頁：93
止頁：99
分類號：TQ175
語種：英文
關鍵詞：MOCVD;Titanium 2;5-dimethylpyrrolyl complexes;Titanium dioxide;
內容簡介The new titanium 2,5-dimethylpyrrolyl complexes [(Me2C4H2N)Ti(NMe2)3] and [(Me2C4H2N)Ti(m2-OiPr)(OiPr)2]2 and the previously reported titanium pyrrolyl complex [(C4H4N)Ti(m2-OiPr)(OiPr)2]2 are synthesized and chemically and structurally characterized. Single-crystal X-ray diffraction (XRD) data show that [(Me2C4H2N)Ti(NMe2)3] is monomeric with a pseudotetrahedral geometry and contains an N-s bonded 2,5-dimethylpyrrolyl ligand. The complexes [(Me2C4H2N)Ti (m2-OiPr)(OiPr)2]2 and [(C4H4N)Ti(m2-OiPr)(OiPr)2]2 are dimeric and contain two terminal and two bridging isopropoxy groups and terminal N-s-bonded pyrrolyl ligands. The complexes [(Me2C4H2N)Ti(NMe2)3] and [(Me2C4H2N)Ti (m2-OiPr)(OiPr)2]2 are investigated as precursors for the deposition of TiO2 by liquid injection metal-organic (MO)CVD. Titanium oxide films deposited at 450 8C from [(Me2C4H2N)Ti(NMe2)3] contain significantly more carbon impurities (C12.7 at.-%) than those grown from [(Me2C4H2N)Ti(m2-OiPr)(OiPr)2]2 (C6.1 at.-%). XRD analysis shows that the titanium oxide films deposited at 450 8C are amorphous.
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