作者：Hojo, D.;Adschiri, T.;
作者單位：Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2010-01-05
卷：16
期：41099
起頁(yè)：248
止頁(yè)：253
分類號(hào)：TQ175
語(yǔ)種：英文
關(guān)鍵詞：Aluminum oxide;Atomic layer deposition;Conformal coatings;Cotton;Three-dimensional structures;
內(nèi)容簡(jiǎn)介Atomic layer deposition (ALD) at 100°C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al _2O _3, even after removing the cotton templates. The replicated woven structures enable direct mass analysis of the cotton coating. Quantitative analysis reveals that the self-limiting reaction of ALD is ensured, even on tortuous cotton surfaces, except for early growth cycles. This unique feature of ALD assures conformal coating onto three-dimensional (3D) networks of cotton. The results demonstrate the possibility of a non-local methodology for evaluating the thickness of a coating on 3D objects at various stages of growth.
所需耐材幣：0
