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- Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
Rowlette, PC;Allen, CG;Bromley, OB;Dubetz, AE;Wolden, CA;TQ175atomic layer deposition (ALD);dimethyl zinc;plasma;zinc oxide;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept CheChemical vapor deposition英文2009-01-05
- Polymeric Coatings Deposited From an Aerosol-Assisted Non-thermal Plasma Jet
O'Neill, L;O'Sullivan, C;TQ175aerosol;fluorocarbon;plasma;polymer;surface energy;Dow Corning Plasma Solut, Cork, Ireland.;Dow Corning Plasma Solut, Cork, Ireland.Chemical vapor deposition英文2009-01-05
- ALD of YF3 Thin Films from TiF4 and Y(thd)(3) Precursors
Munnik, F;Leskela, M;Ritala, M;Pilvi, T;Puukilainen, E;TQ175ALD;Optical materials;Thin films;YF3;Inst Ion Beam Phys & Mat Res, Forschungszentrum Dresden Rossendorf, D-01314 Dresden, Germany.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, FinlaChemical vapor deposition英文2009-01-05
- Properties of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 2
Walkiewicz-Pietrzykowska, A;Wrobel, AM;Glebocki, B;TQ175amorphous materials;density;hydrogenated silicon carbide films;mechanical properties;refractive index;surface morphology;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.Chemical vapor deposition英文2009-01-05
- Fabrication and Characteristics of Carbon Nanofiber-Reinforced Carbon/Carbon Composites by Fast Catalytic Infiltration Processes
Zhang, JC;Luo, RY;Wu, XW;Li, Q;TQ175carbon nanofibers;chemical vapor infiltration (CVI);fiber/matrix bond;hybrid multiscale composites;modeling;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ AeronChemical vapor deposition英文2009-01-05
- Improvement of Brick Deterioration Resistance in the Transition Zone of a Cement Rotary Kiln
TAMIATSU KOYAKE;MASAMICHI TAKAI;HIDENORI TADA;TQ175Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, Bizen City, Okayama 705-0002;Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, Bizen City, Okayama 705-0002;Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, BizenJournal of the Technical Association of Refractories英文2009-01-05
- Improvement in Refractory Life of a Cement Rotary Kiln by Mechanical Maintenance
KOZO TOKUNAGA;MAKOTO OHNO;EIICHI NAKAJIMA;TQ175Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027;Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027;Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027Journal of the Technical Association of Refractories英文2009-01-05
- Development of Chamotte Brick Preventing Structural Spalling for Calcining Zone of Cement Rotary Kiln
KAZUNARI IMAI;TAKAO TAKADA;TQ175Yotai Refractories Co., Ltd. 2601 Hinase-cho, Bizen-shi, Okayama 701-3204;Yotai Refractories Co., Ltd. 2601 Hinase-cho, Bizen-shi, Okayama 701-3204Journal of the Technical Association of Refractories英文2009-01-05
- Development of Technology for Reducing Brick Relining Time of a Basic Oxygen Furnace (BOF)
YOSHIKAZU KUBO;HIROSHI YOSHIDA;KIYOHITO FUJIWARA;TQ175Sumikin Iron & Steel Corporation 1850, Minato, Wakayama city, Wakayama 640-8555;Sumikin Iron & Steel Corporation 1850, Minato, Wakayama city, Wakayama 640-8555;Sumikin Iron & Steel Corporation 1850, Minato, Wakayama city, Wakayama 640-8555Journal of the Technical Association of Refractories英文2009-01-05
- PECVD of Fluorocarbon Coatings from Hexafluoropropylene Oxide: Glow vs. Afterglow
Francesca Intranuovo;Eloisa Sardella;Pasqua Rossini;Riccardo d’Agostino;Pietro Favia;TQ175Afterglow;Coatings;Hexafluoropropylene oxide;Microstructures;PECVD;Department of Chemistry, University of Bari via Orabona, 4, 70126 Bari (Italy);CNR-IMIP Institute of Inorganic Methodologies and Plasma (IMIP) Bari (Italy);Plasma Solution Srl, Spin off of the University of Bari via Orabona, 4, 70126 Bari (Italy);DepartmeChemical vapor deposition英文2009-01-05
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