作者：Panneerselvam, A;Malik, MA;O'Brien, P;Helliwell, M;
作者單位：Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2009-01-05
卷：15
期：40911
起頁(yè)：57
止頁(yè)：63
分類(lèi)號(hào)：TQ175
語(yǔ)種：英文
關(guān)鍵詞：AACVD;Silver;Thin films;Single-source precursors;Temperature gradient;
內(nèi)容簡(jiǎn)介Thin films of silver are deposited from tetraplienyldioxoimidodiphosphinato silver(I) [Ag{(OPPh2)(2)N}](4)center dot 2H(2)O (1) and silver(I) triflouoroacetate CF3COOAg (2) single-source precursors (SSPs) by the aerosol-assisted (AA)CVD method. The complex (1) is a tetramer with linear and distorted tetrahedral coordination modes at silver. Two types of films, silvery and brownish, are observed from both SSPs due to the temperature gradient in the AACVD reactor. The as-deposited films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, and ultraviolet/visible (UV-vis) spectroscopy methods.
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