作者：Jose Luis Yague;Nuria Agullo;Salvador Borros;
作者單位：Grup d’Enginyeria de Materials (GEMAT), Institut Quimic de Sarria-Universitat Ramon Llull Via Augusta 390, 08017 Barcelona (Spain);Grup d’Enginyeria de Materials (GEMAT), Institut Quimic de Sarria-Universitat Ramon Llull Via Augusta 390, 08017 Barcelona (
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2009-01-05
卷：15
期：41005
起頁：128
止頁：132
分類號(hào)：TQ175
語種：英文
關(guān)鍵詞：nucleation processes;plasma polymerization;polypyrrole;self-assembled monolayers;silane;
內(nèi)容簡介The development of conducting polymers has become the aim of many research groups. This paper describes attempts to carry out a plasma polymerization of polypyrrole (PPy) on a nanostructured surface by attaching a 11-(pyrrol-1-yl-undecyl)dimethylchlorosilane molecule onto a silicon wafer surface in order to form a self-assembled monolayer (SAM). The effect of theSAMin the polymerization process is also studied. Important differences in the polymer deposition are found whether or not the surface has been modified with a SAM. Atomic force microscopy (AFM) and time-of-flight secondary ion mass spectrometry (TOFSIMS) analyses are performed to study the morphology, deposition, and growth of polypyrrole.
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