作者：Smirnova, T.P.;Lebedev, M.S.;Morozova, N.B.;Semyannikov, P.P.;Zherikova, K.V.;Kaichev, V.V.;Dubinin, Y.V.;
作者單位：Nikolaev Institute of Inorganic Chemistry of Siberian, Branch of Russian Academy of Science 3, Acad. Lavrentieva Pr., Novosibirsk, 630090, Russian Federation;Nikolaev Institute of Inorganic Chemistry of Siberian, Branch of Russian Academy of Science 3, Ac
刊名：Chemical vapor deposition
ISSN：0948-1907
出版年：2010-01-05
卷：16
期：41005
起頁：185
止頁：190
分類號：TQ175
語種：英文
關鍵詞：Hafnium aluminate;Hafnium dioxide;High-k dielectric;Thin films;XPS;
內容簡介Investigation of the thermal behavior of Hf(dpm)4 vapor in vacuum is carried out. An approach for obtaining films of (HfO) _x_2O_3)_(1-x) alloys is developed. The use of a source containing a mixture of two precursors differing from each other in volatility, notably Hf(dpm)4 (dpm~-dipivaloylmethanate, 2,2,6,6-tetramethylheptane-3,5-dionate) and Al(acac)3 (acac~-pentane- 2,4-dionate), allows us to employ the possibilities of combinatorial chemistry, and to obtain and analyze a number of different compositions of alloys. Film characterization is performed using a set of analytical methods. The character of Al and Hf distributions across the film thickness, depending on their content in the source, is investigated. The use of laser null ellipsometry allows us to determine the distribution of the refractive index across the thickness of the (HfO) _(x2)O_3)_(1-x) film. A comparison of the ellipsometric data with the X-ray photoelectron spectroscopy (XPS) data shows that the character of the refractive index variation reproduces the variation of the chemical composition across the film thickness.Auniform distribution of the elements across the film thickness is observed in the cases when separated sources are used. The structure of the film depends on the molar fraction of Al_2O_3 in alloys. For Al≥30 at.-% amorphization of the structure occurs.
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